CMOS technology

E809918

integrated circuit fabrication process semiconductor technology

CMOS technology is a widely used semiconductor process for building integrated circuits, particularly efficient digital logic and memory, that has historically benefited from transistor miniaturization trends like Dennard scaling.

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Observed surface forms (1)

Surface form	Occurrences
CMOS	3

Statements (53)

Predicate	Object
instanceOf	integrated circuit fabrication process ⓘ semiconductor technology ⓘ
abbreviation	CMOS NERFINISHED ⓘ
benefitsFrom	Dennard scaling NERFINISHED ⓘ Moore's law NERFINISHED ⓘ
competesWith	BiCMOS technology ⓘ bipolar technology ⓘ
dominantFor	digital VLSI design ⓘ
evolvedInto	FD-SOI CMOS processes NERFINISHED ⓘ FinFET CMOS processes ⓘ
fabricationUses	chemical–mechanical polishing ⓘ ion implantation ⓘ photolithography ⓘ silicon dioxide gate dielectrics ⓘ silicon wafers ⓘ thin-film deposition ⓘ
fullName	complementary metal–oxide–semiconductor technology ⓘ
historicalTrend	continuous transistor size scaling ⓘ increasing transistor density ⓘ reduction of supply voltage ⓘ
keyAdvantage	compatibility with digital logic ⓘ high integration density ⓘ high noise immunity ⓘ low static power consumption ⓘ scalability to smaller feature sizes ⓘ
keyFeature	complementary and symmetrical pairs of p-type and n-type MOSFETs ⓘ
limitation	leakage currents at very small geometries ⓘ short-channel effects ⓘ variability at nanometer scales ⓘ
powerCharacteristic	dynamic power dominated by switching activity ⓘ nearly zero DC power in steady logic states ⓘ
primaryApplication	ASICs NERFINISHED ⓘ digital integrated circuits ⓘ digital logic circuits ⓘ microcontrollers ⓘ microprocessors ⓘ static RAM ⓘ system-on-chip devices ⓘ
supportsCircuitType	combinational logic GENERATED ⓘ dynamic memory cells GENERATED ⓘ sequential logic GENERATED ⓘ static memory cells GENERATED ⓘ
usedIn	RF integrated circuits ⓘ computers ⓘ consumer electronics ⓘ embedded systems ⓘ image sensors ⓘ memory chips ⓘ mixed-signal integrated circuits ⓘ mobile devices ⓘ
usesTransistorPolarity	nMOS NERFINISHED ⓘ pMOS ⓘ
usesTransistorType	MOSFET NERFINISHED ⓘ

Referenced by (4)

Full triples — surface form annotated when it differs from this entity's canonical label.

Dennard scaling → appliesTo → CMOS technology ⓘ

G4 → manufacturingProcess → CMOS technology ⓘ

this entity surface form: CMOS

MOSFETs → supportsTechnology → CMOS technology ⓘ

subject surface form: MOSFET

this entity surface form: CMOS

PAL devices → technology → CMOS technology ⓘ

subject surface form: PAL device

this entity surface form: CMOS