Triple
T8399841
| Position | Surface form | Disambiguated ID | Type / Status |
|---|---|---|---|
| Subject | EUV lithography |
E198143
|
entity |
| Predicate | keyComponent |
P5688
|
FINISHED |
| Object |
EUV pellicle
An EUV pellicle is an ultra-thin, highly transparent protective membrane used in extreme ultraviolet lithography systems to shield photomasks from particle contamination during semiconductor manufacturing.
|
E730662
|
NE FINISHED |
Provenance (5 batches)
| Stage | Batch ID | Job type | Status |
|---|---|---|---|
| creating | batch_69ca82f816bc8190ab321c07d72208c1 |
elicitation | completed |
| NER | batch_69cb824bfcbc8190b26bfcb5f8c4777c |
ner | completed |
| NED1 | batch_69cde86f6e148190812a8a9737310501 |
ned_source_triple | completed |
| NED2 | batch_69cded2fa42c8190bfbfc79caf38bf8e |
ned_description | completed |
| NEDg | batch_69cdebfd60188190a1681344e2bf1e9e |
nedg | completed |
Created at: March 30, 2026, 6:04 p.m.