Disambiguation evidence for Fresnel zone plates via surface form
"Fresnel zone plate"
As subject (58)
Triples where this entity appears as subject under the
label "Fresnel zone plate".
| Predicate | Object |
|---|---|
| basedOn | diffraction ⓘ |
| basedOn | interference ⓘ |
| characterizedBy | diffraction efficiency ⓘ |
| characterizedBy | focal length ⓘ |
| characterizedBy | outermost zone width ⓘ |
| differsFrom | refractive lens ⓘ |
| fabricatedBy | X-ray lithography ⓘ |
| fabricatedBy | electron-beam lithography ⓘ |
| fabricatedBy | nanoimprint lithography ⓘ |
| fabricatedFrom | gold ⓘ |
| fabricatedFrom | nickel ⓘ |
| fabricatedFrom | tungsten ⓘ |
| fabricatedOn | silicon nitride membrane ⓘ |
| fabricatedOn | silicon substrate ⓘ |
| focusesBy | constructive interference ⓘ |
| governedBy |
Fresnel diffraction theory
ⓘ
surface form:
Fresnel diffraction
|
| hasAdvantage | no bulk material needed for focusing ⓘ |
| hasAdvantage | suitable for high-energy photons where lenses are impractical ⓘ |
| hasLimitation | limited efficiency in first order ⓘ |
| hasLimitation | strong wavelength dependence ⓘ |
| hasProperty | acts as a lens alternative ⓘ |
| hasProperty | can achieve very small focal spots ⓘ |
| hasProperty | chromatic ⓘ |
| hasProperty | focuses light ⓘ |
| hasProperty | high numerical aperture possible ⓘ |
| hasProperty | lightweight ⓘ |
| hasProperty | multiple diffraction orders ⓘ |
| hasProperty | thin element ⓘ |
| hasStructure | alternating transparent and opaque zones ⓘ |
| hasStructure | concentric rings ⓘ |
| hasStructure | radially varying period ⓘ |
| hasType | amplitude zone plate ⓘ |
| hasType | binary zone plate ⓘ |
| hasType | kinoform zone plate ⓘ |
| hasType | multilevel zone plate ⓘ |
| hasType | phase zone plate ⓘ |
| hasType | spiral zone plate ⓘ |
| hasType | stacked zone plate ⓘ |
| instanceOf | diffractive optical element ⓘ |
| instanceOf | focusing element ⓘ |
| instanceOf | optical component ⓘ |
| namedAfter | Augustin-Jean Fresnel ⓘ |
| operatesIn | X-ray regime ⓘ |
| operatesIn | extreme ultraviolet ⓘ |
| operatesIn | infrared ⓘ |
| operatesIn | visible light ⓘ |
| usedFor | EUV lithography ⓘ |
| usedFor | X-ray microscopy ⓘ |
| usedFor | beam focusing ⓘ |
| usedFor | beam shaping ⓘ |
| usedFor | micro- and nano-imaging ⓘ |
| usedFor | soft X-ray imaging ⓘ |
| usedFor | spectroscopy ⓘ |
| usedFor | zone-plate telescopes ⓘ |
| usedIn | free-electron laser beamlines ⓘ |
| usedIn | laboratory X-ray microscopes ⓘ |
| usedIn | synchrotron radiation facilities ⓘ |
| usesPrinciple | Huygens–Fresnel principle ⓘ |