Triple

T8399797
Position Surface form Disambiguated ID Type / Status
Subject EUV lithography E198143 entity
Predicate instanceOf P0 FINISHED
Object lithography technology C21471 CONCEPT FINISHED

How this triple was built (1 step)

Every LLM step that produced this triple, in pipeline order — named-entity classification, the disambiguation choices (the exact options shown, with the pick highlighted), and the generated description. The batch + timestamp of each is in the Provenance table below.

CD Concept disambiguation gpt-5-mini-2025-08-07 
Target class: lithography technology
Context triple: [EUV lithography, instanceOf, lithography technology]
  • A. scanning probe lithography technique
    A scanning probe lithography technique is a nanofabrication method that uses a sharp, movable probe to directly pattern surfaces with high spatial resolution through mechanical, thermal, electrical, or chemical interactions.
  • B. integrated circuit technology
    Integrated circuit technology is the design and fabrication of miniaturized electronic circuits on semiconductor chips, enabling complex, high-speed, and low-power electronic systems.
  • C. microelectronics technology
    Microelectronics technology is the field focused on designing, fabricating, and integrating extremely small electronic components and circuits—such as transistors, diodes, and integrated circuits—on semiconductor substrates to enable compact, high-performance electronic systems.
  • D. nanofabrication method chosen
    A nanofabrication method is a process or technique used to create, modify, or assemble structures and devices with features at the nanometer scale.
  • E. lithographic print
    A lithographic print is an image produced by transferring ink from a flat, chemically treated stone or metal plate onto paper, typically in multiple copies.
  • F. None of above.

Provenance (1 batch)

The batch behind each pipeline step, in order, with when it ran. Timestamps are batch-level — stages were processed in waves, so the object chain (NER → NED1 → NEDg → NED2) reads in order, but predicate / elicitation batches can sit in a different wave.

Step Stage Batch ID Status When
creating Elicitation batch_69ca82f816bc8190ab321c07d72208c1 completed March 30, 2026, 2:04 p.m.
Created at: March 30, 2026, 6:04 p.m.