Triple
T14232346
| Position | Surface form | Disambiguated ID | Type / Status |
|---|---|---|---|
| Subject | ASML |
E352781
|
entity |
| Predicate | notableProduct |
P1448
|
FINISHED |
| Object | extreme ultraviolet (EUV) lithography systems |
E198143
|
NE FINISHED |
How this triple was built (2 steps)
Every LLM step that produced this triple, in pipeline order — named-entity classification, the disambiguation choices (the exact options shown, with the pick highlighted), and the generated description. The batch + timestamp of each is in the Provenance table below.
NER
Named-entity recognition
gpt-5-mini
Instruction
Given a phrase, classify it is english named entity (e.g., persons, organizations, works of art) in Latin script, or not (e.g., literals, dates, URLs, verbose phrases). For disambiguation, the statement where the phrase occurs as object is also given. Please return a JSON object with `phrase` (string, the phrase being analyzed) and `is_ne` (boolean, indicating whether the phrase is a Named Entity).
Input
Phrase: extreme ultraviolet (EUV) lithography systems | Statement: [ASML, notableProduct, extreme ultraviolet (EUV) lithography systems]
NED1
Entity disambiguation (via context triple)
gpt-5-mini-2025-08-07
Target entity: extreme ultraviolet (EUV) lithography systems Context triple: [ASML, notableProduct, extreme ultraviolet (EUV) lithography systems]
-
A.
EUV lithography
chosen
EUV lithography is an advanced semiconductor manufacturing technique that uses extremely short-wavelength ultraviolet light to create ultra-fine patterns on microchips, enabling the production of cutting-edge integrated circuits.
-
B.
EUV pellicle
An EUV pellicle is an ultra-thin, highly transparent protective membrane used in extreme ultraviolet lithography systems to shield photomasks from particle contamination during semiconductor manufacturing.
-
C.
EUV mask
An EUV mask is a highly specialized reflective photomask used in extreme ultraviolet lithography to pattern nanometer-scale features onto semiconductor wafers.
-
D.
dip-pen nanolithography
Dip-pen nanolithography is a scanning probe-based nanofabrication technique that uses an atomic force microscope tip to directly "write" nanoscale patterns of molecules onto a substrate with high precision.
-
E.
Tokyo Electron
Tokyo Electron is a leading Japanese manufacturer of semiconductor production equipment and related technologies, serving major chipmakers worldwide.
- F. None of above.
- G. Unsure - the case is ambiguous/there is not enough information to decide.
Provenance (3 batches)
The batch behind each pipeline step, in order, with when it ran. Timestamps are batch-level — stages were processed in waves, so the object chain (NER → NED1 → NEDg → NED2) reads in order, but predicate / elicitation batches can sit in a different wave.
| Step | Stage | Batch ID | Status | When |
|---|---|---|---|---|
| creating | Elicitation | batch_69d8278adc7c8190a9218d69bce3c4e6 |
completed | April 9, 2026, 10:26 p.m. |
| NER | Named-entity recognition | batch_69de622cdd6481908befa179a9675bb5 |
completed | April 14, 2026, 3:50 p.m. |
| NED1 | Entity disambiguation (via context triple) | batch_69fd281bc67c81909bb09ee4a39a0b7f |
completed | May 8, 2026, 12:02 a.m. |
Created at: April 10, 2026, 1:07 a.m.