Wake Shield Facility-1
E835786
Wake Shield Facility-1 was a free-flying experimental platform designed to create ultra-high vacuum conditions in low Earth orbit for advanced materials and thin-film semiconductor research.
Statements (38)
| Predicate | Object |
|---|---|
| instanceOf |
free-flying platform
ⓘ
materials science experiment ⓘ semiconductor research platform ⓘ space experiment ⓘ |
| alsoKnownAs | WSF-1 NERFINISHED ⓘ |
| countryOfOrigin |
United States of America
ⓘ
surface form:
United States
|
| crewCapacity | 0 ⓘ |
| deploymentMethod | deployed from Space Shuttle cargo bay ⓘ |
| designFeature |
free-flying disk-shaped platform
ⓘ
used its wake in orbit to generate ultra-high vacuum ⓘ |
| environment | microgravity ⓘ |
| hostMissionAgency | NASA Space Shuttle Program NERFINISHED ⓘ |
| hostVehicle | Space Shuttle NERFINISHED ⓘ |
| launchDate | 1994-02-03 ⓘ |
| launchedOnMission | STS-60 NERFINISHED ⓘ |
| launchSite |
Kennedy Space Center
NERFINISHED
ⓘ
LC-39A NERFINISHED ⓘ |
| launchVehicle | Space Shuttle Discovery NERFINISHED ⓘ |
| manufacturer |
Space Vacuum Epitaxy Center
NERFINISHED
ⓘ
University of Houston NERFINISHED ⓘ |
| missionRole |
microgravity materials processing experiment
ⓘ
technology demonstration ⓘ |
| operator | NASA ⓘ |
| orbitType | low Earth orbit ⓘ |
| partOf | Wake Shield Facility program NERFINISHED ⓘ |
| programSuccessor |
Wake Shield Facility-2
NERFINISHED
ⓘ
Wake Shield Facility-3 NERFINISHED ⓘ |
| purpose |
advanced materials research
ⓘ
thin-film semiconductor research ⓘ to create ultra-high vacuum conditions in low Earth orbit ⓘ |
| recoveredBy | Space Shuttle Discovery NERFINISHED ⓘ |
| researchField |
materials science
ⓘ
semiconductor thin films ⓘ thin-film epitaxy ⓘ |
| retrievalMethod | retrieved to Space Shuttle cargo bay ⓘ |
| spaceAgency | NASA ⓘ |
| spacecraftType | uncrewed payload ⓘ |
| vacuumLevel | ultra-high vacuum in orbital wake region ⓘ |
Referenced by (2)
Full triples — surface form annotated when it differs from this entity's canonical label.