dip-pen nanolithography

E166832

Dip-pen nanolithography is a scanning probe-based nanofabrication technique that uses an atomic force microscope tip to directly "write" nanoscale patterns of molecules onto a substrate with high precision.

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dip-pen nanolithography canonical 3

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Predicate Object
instanceOf nanofabrication method
nanolithography technique
scanning probe lithography technique
advantage chemical specificity of patterns
no need for photoresist or masks
appliesTo gold substrates
oxide surfaces
self-assembled monolayers
silicon substrates
comparedWith photolithography
controlsBy humidity
ink concentration
tip scanning speed
tip–substrate contact time
tip–substrate force
developedAt Northwestern University
developedBy Chad A. Mirkin
enables bottom-up nanofabrication
multiplexed patterning
site-specific molecular deposition
hasFeature ambient-condition operation
direct-write capability
high spatial resolution
maskless patterning
multi-ink capability
sub-100-nanometer patterning
hasOutput functionalized surfaces
nanoscale molecular patterns
nanostructured patterns
hasProcess direct molecular writing
ink transport from tip to substrate
meniscus-mediated material transfer
introducedIn late 1990s
limitation relatively low throughput compared to optical lithography
relatedTo atomic force microscopy
microcontact printing
scanning probe microscopy
soft lithography
usedIn biosensor fabrication
materials science research
nanobiotechnology
nanoelectronics fabrication
surface chemistry patterning
uses biomolecules
molecular inks
nanoparticle inks
polymers
thiol-based molecules
usesInstrument atomic force microscope tip
scanning probe microscope

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Full triples — surface form annotated when it differs from this entity's canonical label.

Chad Mirkin knownFor dip-pen nanolithography
Chad Mirkin hasPatentOn dip-pen nanolithography
Chad A. Mirkin knownFor dip-pen nanolithography